Professor Ruchhoeft's research interests lie in the development of a parallel printing process with nanoscale resolution using energetic helium ions and atoms and the development of new low-cost stencil masks used in this patterning process. Applications include the patterning of periodic nano-scale patterns for engineered nanoparticles, infrared metal-mesh filters, and water filtration membranes. He is also interested in modeling of resist exposure and development processes for electron, ion, and atom beam lithography, and has authored numerous papers in these areas.
Publications/Creative Works
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